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Custom Liquid Cooling for Wafer-Scale AI Chip: 100W/cm² Solution

Views: 10     Author: Site Editor     Publish Time: 2026-05-21      Origin: Site

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Situation: The Cooling Challenge of Wafer-Scale AI Chips

Air Cooling Fails. Conventional Liquid Cooling Cannot Cover the Area.

Our client, a global leader in AI accelerator development, has created a wafer-scale AI chip with side length exceeding 20cm and single-chip power consumption reaching several kilowatts. Heat flux density exceeds 100W/cm². At this power level, traditional air cooling is physically impossible. Off-the-shelf cold plates that can cover such a large area simply do not exist.

The enormous chip surface area amplifies every cooling challenge. Even minor flow non-uniformity can create local hotspots, triggering performance throttling or even permanent damage — an unacceptable risk for chips deployed in large-scale AI training clusters.

Challenge Summary

Challenge

Description

Air cooling is physically impossible

Heat flux >100W/cm², total power in kilowatts — no air cooling solution can maintain safe junction temperatures

No off-the-shelf cold plate exists

20cm+ side length means 10-20x the surface area of a standard GPU chip — no commercial product available

Zero hotspots — non-negotiable

Any temperature gradient across the chip surface causes compute unit throttling, affecting AI inference consistency

Leak-proof reliability is mandatory

A single micro-crack or void near the chip means catastrophic failure. Zero defects required under long-term pressure cycling

II. Task: One Cold Plate, Full Chip Coverage, No Compromises

The client defined three non-negotiable requirements:

Requirement

Target

Full Coverage

Cover 20cm+ chip surface

Temperature Uniformity

Zero hotspots, zero throttling at full load

Leak-Proof, Mass-Producible

Copper brazing, manufacturing consistency

Core Engineering Challenge

Design a single-piece copper cold plate that simultaneously achieves:

  • Maximized heat exchange area within a compact footprint

  • Optimized internal flow distribution to prevent flow maldistribution

  • Weld contact thermal resistance below measurable thresholds

All of this must be accomplished on a surface area 10x larger than typical GPU cooling solutions.

III. Action: Four-Step Engineering Approach — From Fin Geometry to System Validation

Step 01 — Core Process: Skived Fin Microchannel Architecture

Select high-purity C10100 copper billet and use precision skiving to directly cut ultra-thin, high-density microchannel fins. Each fin unit forms an independent micro-structure, dramatically expanding the effective heat exchange area within the same footprint.

Why skived fins? Unlike brazed or sintered structures, skived fins have no intermediate material or joint interfaces, eliminating additional thermal resistance. This achieves thermal resistance values impossible with conventional milled or folded fins — without increasing height or weight.

This is the same core process used in our CP006 liquid cold plate. [Learn more about CP006 →]

Step 02 — Structural Design: Modular Copper Brazing Assembly

Assemble multiple independent skived fin copper water blocks into a single, large-format cold plate using high-temperature copper brazing, fully covering the wafer-scale chip surface.

Vacuum brazing ensures void-free, micro-crack-free weld seams — eliminating the risk of micro-cracks and delamination under thermal cycling.

Final Result:

  • A leak-free monolithic interface

  • The lowest and most consistent contact thermal resistance across the entire chip area

Step 03 — Temperature Uniformity: CFD-Optimized Flow Distribution

Use Computational Fluid Dynamics (CFD) simulation to design internal manifold geometry:

  • Design parallel and multi-pass flow channels to balance pressure drop and heat pickup

  • Ensure coolant reaches every region of the chip — including corners and edges where hotspots typically form — at uniform flow rate and temperature

  • Minimize the temperature delta between inlet and outlet for uniform heat dissipation across the entire chip area

Step 04 — Validation: System-Level Qualification Testing

Comprehensively test the complete cold plate under realistic operating conditions:

Test Item

Purpose

Thermal Cycling

Verify reliability under power fluctuations

Pressure & Leak Testing

Confirm long-term sealing integrity

Infrared Thermal Imaging

Confirm no local hotspots across the entire chip surface

All tests passed client specifications.

Key Technical Specifications

Parameter

Specification

Significance

Cold Plate Material

C10100 Copper

Highest thermal conductivity, 390 W/m·K

Fin Process

Skived Microchannel

3-5x heat exchange area vs. milled channels

Chip Coverage Area

>400 cm² (20cm+ side length)

Full wafer-scale chip coverage

Heat Flux Capacity

>100 W/cm²

Handles extreme AI accelerator power

Assembly Method

Copper Brazing (Vacuum)

Void-free seams, zero micro-leakage risk

Temperature Uniformity

Zero detectable hotspots

Consistent compute performance across all chip regions

Operating Pressure

Validated to customer spec

Long-term cyclic pressure testing

Contact Surface

Precision machined

Minimized thermal interface resistance

IV. Result: Performance Achieved, Mass Production Delivered

⚡ Performance Achieved

Achieved stable liquid cooling for wafer-scale AI chips under full multi-kW load. Thermal control targets met under all operating conditions. Zero thermal throttling events during continuous AI training workloads.

Technical Validation

Proved the feasibility of the "skived fin + copper brazing modular assembly" architecture for wafer-scale and larger applications. Established a reusable thermal technology platform for next-generation, higher-power-density AI accelerators.

Customer Value

  • Customer achieved stable mass production of their large-scale AI computing system

  • Thermal-related chip failure risks eliminated

  • Equipment service life extended

  • Competitive position in the AI compute infrastructure market strengthened

V. Why This Case is a Reference for AI Chip Cooling

As AI model complexity grows exponentially, chip power density follows the same curve. The era of wafer-scale computing — with single-chip power consumption reaching kilowatts — has arrived.

This project proves that a well-designed, vacuum-brazed skived fin copper cold plate is the thermal foundation layer for this generation of AI hardware. What we built is not a one-off solution but a scalable architecture that engineering teams can adapt to any wafer-scale or large-die chip project.

VI. Application Areas

Application

Description

AI Training Clusters

Infrastructure for large-scale LLM and diffusion model training

HPC / Supercomputing

Scientific simulation nodes with kW-class processor power

AI Inference Servers

Data center inference clusters requiring large-scale stable performance

Autonomous Driving

High compute density AI platforms in vehicle and roadside systems

Phased Array Radar

Thermal management for large-aperture, high-power electronics

VII. About Us

Greatminds Thermal Technology

A professional engineering team focused on custom liquid cooling solutions for AI chips, high-performance computing, and industrial electronics. With precision skiving manufacturing and vacuum brazing capabilities, our product portfolio spans from embedded systems to wafer-scale AI accelerators.

VIII. Contact Us

Developing high-power AI chips? Need a custom cold plate?

Our thermal management engineering team has already solved wafer-scale cooling challenges with skived microchannel and copper brazing solutions. Tell us your chip size, power density, and reliability requirements — we will provide a feasibility assessment within 2 business days.

Website: www.greatminds-cn.com
Email: info@greatminds.com.cn

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 Suzhou Greatminds Technology Co.,Ltd.Building 7, Zhongchuanglian Technology Industry Park, No.35 Dongfu Road, SIP, Suzhou
 Dongguan Greatminds Electronic Technology Co.,Ltd. #101,Builidng 14, #142 West Jinghai Road, Chang'an, Dongguan
 info@greatminds.com.cn

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